发明名称 PATTERN MATCHING METHOD
摘要 PURPOSE:To enable shortening of the processing time of recognition by moving a coarse standard pattern at every skip width and providing a new search area widened for the skip width outside the coordinates where the relation coefficient to this pattern becomes maximum. CONSTITUTION:A coarse standard pattern RF1 thined for every specified pixel of a standard pattern RF2 in XY directions is adjusted to the left upper end of a search area SA1 and a relation coefficient of RF1 to SA1 is obtained. The RF1 is gradually moved for a specified skip width to XY directions and this process is repeated. When the RF1 moved for all SA1, the RF 1 is adjusted to the coordinate where the relation coefficient becomes maximum at a new search area SA2 widened for SK to the outside is set. An inspected pattern OB is included in the SA2. Then SK width is halved and a new search area SA3 is similarly obtained from SA2. The RF2 is moved at every pixel G in SA3 to XY directions, a coordinates where the relation coefficient of RF2 to the SA3 becomes maximum, is obtained and the position of OB is specified.
申请公布号 JPH06160047(A) 申请公布日期 1994.06.07
申请号 JP19920198103 申请日期 1992.07.24
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ABE HISAKI
分类号 G01B11/24;G06T1/00;G06T7/00 主分类号 G01B11/24
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