| 摘要 |
<p>PURPOSE:To obtain the subject composition containing a specific UV light- curable resin, excellent in resolution, solvent resistance, electric characteristics, etc., extremely good in heat resistance, capable of forming a good pattern even in a low UV light exposure, and capable of being developed with a dilute alkali aqueous solution. CONSTITUTION:The objective composition contains (A) a UV light-curable resin produced by reacting an (un)saturated polybasic acid anhydride (e.g. maleic anhydride) with the reactional product of a compound of the formula (R is the residue of an organic compound having K¦¦X¦¦ active hydrogen atoms; n1-nk are 0-50, their sum being 1-50) with an unsaturated monocarboxylic acid (preferably acrylic acid), (B) a photopolymerization initiator (e.g. benzoin), (C) a diluent (e.g. 2-hydroxyethyl acrylate), and (D) a thermally curable epoxy compound (e.g. bisphenol A epoxy resin). The compound of the formula is produced e.g. by the ring-opening polymerization of 4-vinylcyclohexene-1-oxide in the presence of a triol such as glycerol, methanol, propanol, etc., as a polymerization initiator.</p> |
