| 摘要 |
PURPOSE:To form the deposited films with excellent properties very efficiently by a method wherein a cylinder type substrate is utilized as discharging electrode and DC bias is impressed between a pair of electrodes. CONSTITUTION:A deposition chamber 101 is connected to a vacuum pump through an exhaust pipe 111 and the internal pressure of the chamber may be controlled corresponding to the optimum pressure specified to discharge. Among the opposing cylinder type substrates 102, 103, one is connected to the high voltage side of RF through high tension cable 109 and the other is grounded together with other metallic parts. Now the internal pressure of the deposition chamber 101 is adjusted to say 0.2Torr. Next turn RF power supply switch ON with DC bias of +200V preliminarily impressed to supply both electrodes with power of 300W discharging electricity. Through these procedures, several deposited films with excellent properties may be formed from both electrodes very efficiently. |
