High-voltage semiconductor device having silicon-on-insulator structure with reduced on-resistance.

摘要

A high-voltage metal-oxide-semiconductor transistor device having a semiconductor-on-insulator structure comprises a substrate (21, 41), an insulator layer (22, 42a) provided on the substrate, a semiconductor layer (23, 44) of a first conductive type provided on the insulator layer, a source region (27, 48) of a second conductive type defined in the semiconductor layer, a drain region (28, 49) of the second conductive type defined in the semiconductor layer, a gate insulator film (24, 45) provided on the semiconductor layer so as to cover a part of the surface of the semiconductor layer adjacent to the source region, a gate electrode (25, 46) provided on the gate insulator film, an offset region (29, 47) defined in the semiconductor layer between the part of the semiconductor layer covered by the gate insulator film and the drain electrode, a less-doped region (29a, 47a) defined within the offset region at an upper part thereof, a control electrode (26, 43) provided between the substrate and the insulator layer so as to extend along a boundary between the insulator layer and the substrate at least under the offset region, and a driving circuit (20) for supplying a control voltage to the control electrode simultaneously and in response to the gate voltage with such a magnitude that an inversion layer is formed in the semiconductor layer along the control electrode when the control voltage is applied to the control electrode.