发明名称 HEATING DEVICE FOR THIN-FILM MANUFACTURING APPARATUS
摘要 <p>PURPOSE:To achieve that a thin film formed on the surface of a substrate is made uniform and to enhance the quality of the thin film by individually controlling a plurality of divided heating-element patterns at the inside and the outside. CONSTITUTION:A heating element 4 formed on the surface of a heat insulating material is divided into, and formed as, a circular heating element pattern 41, at the inner circumferential side, whose center corresponds to the center of a substrate and a heating-element pattern 42, at the outer circumferential side, which is formed in a concentric circle shape at its outer circumference. When the respective heating-element patterns 41, 42 are controlled individually, the heat-generating amount of the heating-element patterns 41, 42 at the inner circumferential part and the outer circumferential part can be set properly according to the heating temperature of the substrate, and the surface of the substrate can be heated nearly uniformly to a desired temperature.</p>
申请公布号 JPH06151322(A) 申请公布日期 1994.05.31
申请号 JP19920296165 申请日期 1992.11.05
申请人 NIPPON SANSO KK 发明人 TABUCHI TOSHIYA
分类号 H01L21/205;H01L21/68;H01L21/683;(IPC1-7):H01L21/205 主分类号 H01L21/205
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