| 摘要 |
PURPOSE:To provide a manufacturing method of an acceleration sensor with an operation part of a uniform thickness. CONSTITUTION:A foundation 40 is formed by providing an insulation film to a surface of a metallic substrate which also functions as a lower electrode. A several mum-thick Si3N4 film as an etching stopper film 42, A some dozens mum-thick SiO2 film as an intermediate film 44 and a several mum-thick Si film as a preliminary film are formed one by one on the foundation 40. After an upper electrode 50 and a load part 52 are formed, an opening part which exposes the intermediate film 44 is formed, and an a cavity part 58 is formed by etching and removing at least the part of the exposed intermediate film 44 and the intermediate film 44 below a region 48 which becomes an operation part. Thereby, an operation part 60 is formed and the part of the intermediate film which is not etched is made to remain as a spacer layer 62. |
