发明名称 ELIMINATING METHOD OF RESIST FILM IMAGE AND PRESSURE-SENSITIVE ADHESIVE AGENT OR ADHESIVE SHEET THEREFOR
摘要 PURPOSE:To easily and surely eliminate an ion-implanted resist film image, by using a specified adhesive sheet. CONSTITUTION:An adhesive sheet using pressure-sensitive adhesive agent containing water or hydrophilic compound which are turned into a microcapsule state is stuck on a resist film image on a semiconductor substrate which is preferably heated. Microcapsules in the adhesive agent expand and burst due to the heat, and the water or the hydrophilic compound comes into contact with the resist film image. Thereby the resist film image is swelled or the adhesion of the interface between the semiconductor substrate and the resist film image is decreased. Then the adhesive sheet is peeled. Hence the ion- implanted resist film image can be excellently eliminated from the semiconductor substrate, together with the adhesive sheet.
申请公布号 JPH06151301(A) 申请公布日期 1994.05.31
申请号 JP19920298828 申请日期 1992.11.09
申请人 NITTO DENKO CORP 发明人 NAMIKAWA AKIRA;KIHARA YASUO;SAITO KIYOSHI;AIZAWA KAORU;SHIMODAN HIDEAKI
分类号 C09J5/00;C09J7/02;G03F7/42;H01L21/027;H01L21/30;(IPC1-7):H01L21/027 主分类号 C09J5/00
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