发明名称 EXPOSURE DEVICE FOR OPTICAL MASTER DISK
摘要 PURPOSE:To provide the exposure device for an optical master disk which stably controls a light quantity even if there are defects, etc., on a photoresist substrate. CONSTITUTION:This exposure device for the optical master disk has an optical system including an objective lens 4 for condensing a laser beam for exposure onto a photoresist substrate 2. The device is provided with a laser oscillator 1, the objective lens 4 having a reflection coat for separating the laser beam from this laser oscillator to the laser beam for exposing the photoresist substrate and the laser beam as sample light, a detector 5 for detecting this sample light and a control circuit 6 for comparing the detection signal from this detector and a set signal. The fluctuations in the light quantity of the laser beam during exposure are so controlled by this control circuit 6 as to be decreased to decrease the fluctuations in the light quantity during the exposure.
申请公布号 JPH06150398(A) 申请公布日期 1994.05.31
申请号 JP19920327314 申请日期 1992.11.12
申请人 RICOH CO LTD 发明人 MIZUTA OSAMU
分类号 G03F7/20;G11B7/125;G11B7/135;G11B7/26;H01L21/027 主分类号 G03F7/20
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