PROCESS OF FORMATION OF PHOTORESIST MASK,申请号SU19894701767-传众专利搜索

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发明名称	PROCESS OF FORMATION OF PHOTORESIST MASK
摘要
申请公布号	RU1667529(C)	申请公布日期	1994.05.30
申请号	SU19894701767	申请日期	1989.06.08
申请人	KRASNOZHON A.I.;FROLOV V.V.;KHVOROV L.I.	发明人	KRASNOZHON A.I.;FROLOV V.V.;KHVOROV L.I.
分类号	G03F7/26;(IPC1-7):G03F7/26	主分类号	G03F7/26
代理机构		代理人
主权项
地址

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