| 摘要 |
<p>PURPOSE:To obtain a color filter pattern of high resolution and to shorter processes and to obtain a thin film by using a positive photosensitive material consisting of thermosetting agent, dye, and photosensitive agent consisting of alkali soluble resin and 1,2-naphthoquinonediazide sulfonate. CONSTITUTION:This positive photosensitive material to form a color filter consists of polymer, photosensitive agent, thermosetting agent, dye, and solvent. The polymer used is an alkali-soluble resin. The photosensitive agent is 1,2- naphthoquinonediazide sulfonate. The thermosetting agent is such a compd. that can give heat resistance and solvent resistance to the photosensitive material by heat treatment after patterning. The alkali-soluble resin is not limited as far as it is soluble with a solvent and can form a film. It is preferable that the alkali-soluble resin is a vinylphenol polymer or novolac resin which is polymer condensate of phenols and aldehydes with addition of hydrogen and/or partly modified hydroxyl groups so that the resin maintains its transparency when heated again.</p> |
