| 摘要 |
PURPOSE:To enable a designer of mask patterns to engage solely in circuit design regardless of the layout of phase shift patterns so that the fine patterning having high reliability can be executed. CONSTITUTION:The patterns which are the phase shift patterns 10 to be used for a photoexposing process and are equally spaced by phase shift layers 12 are formed on one surface of a transparent substrate 11. The light past the phase shift patterns 10 makes the uniform irradiation of mask patterns 13 possible with the light having a specified angle with zero order light. The light with which the edges of the mask patterns 13 is irradiated is diffracted by the edges of the mask patterns 13 and the zero order light and first order light thereof are eventually imaged through the inside of the pupil plane of a projecting optical system, by which the fine patterns improved in resolution are formed. |
