| 摘要 |
PURPOSE:To provide the positive type radiation sensitive resin composition especially adapted to a resist for forming an integrated circuit. CONSTITUTION:This positive type resin composition comprises an alkali-soluble resin and 1, 2-quinonediazidosulfonic acid ester obtained by condensing tetrahydroxybenzophenone with 1, 2-quinonediazidosulfohalide in the presence of an amine thus permitting the obtained resin composition to be high in the proportion of tetraester, freed of mixing of fine metallic residues derived from a used basic catalyst, and to form a resist pattern superior in developability and high in resolution, to be sensitive to ultraviolet rays, far ultraviolet rays, X-rays, electron beams, molecular beams, gamma rays, synchrotron beams, proton beams, on the like, and especially suitable for the resist for forming integrated circuits. |
