CLEANING METHOD FOR CVD APPARATUS,申请号JP19920324953-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	CLEANING METHOD FOR CVD APPARATUS
摘要
申请公布号	JPH06145990(A)	申请公布日期	1994.05.27
申请号	JP19920324953	申请日期	1992.11.10
申请人	HITACHI ELECTRON ENG CO LTD	发明人	OYAMA KATSUMI
分类号	H01L21/205;C23C16/44;(IPC1-7):C23C16/44	主分类号	H01L21/205
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Rim flexible manufacturing insert

Lottery select game

PROCESS AND APPARATUS FOR PRODUCING A NONWOVEN WEB

CONTROL APPARATUS OF IMAGE FILING SYSTEM

Process for the catalytic decomposition of chlorofluoro-alkanes

DISPLAY DEVICE BY MEANS OF A HAND

Objective lens system for endoscopes

Economic and military conflict board game

5'-diphosphohexose nucleoside pharmaceutical compositions

Method for molding an article integrated with a multi-layer flexible circuit and an apparatus for carrying out the method

Method and apparatus for treating toner image bearing receiving sheets

PROCESS FOR MIXING TWO LIQUIDS

Screen printer.

Electron microscope.

Method for immunoassay and apparatus therefor.

Use of a mixed catalyst system to improve the viscosity stability of rosin resins.

Electrostatic recording apparatus.

Laminate flooring.