| 摘要 |
PURPOSE:To provide the method for eliminating the generation of dust by cracking and peeling of a coating glass layer generated by calcination of the outer periphery and peripheral parts of the phase shift photomask. CONSTITUTION:This process for production of the phase shift photomask includes a process for coating the surface of a quartz substrate 1 with coating glass, a stage for irradiating photomask pattern regions with energy rays 10 and solidifying the coating glass with which these regions are coated and a stage for etching the coating glass, exclusive of these regions, which is not irradiated with the energy rays 10 and is not solidified by org. solution. |
