发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THAT
摘要 PURPOSE:To obtain such a photosensitive resin that has excellent coating property, has excellent storage stability without the change in viscosity or deterioration in coating property during storage, has a wide process latitude and easy working property for patterning, and does not produce defect such as uneven coating and stripes after coating. CONSTITUTION:This photosensitive resin compsn. essentially consists of an alkali-soluble siloxane polymer, compd. which produces a reaction promotor with light, and solvent. The alkali-soluble siloxane polymer is obtd. by adding water and catalyst to alkoxysilane to effect hydrolysis condensation and then removing water and catalyst from the reaction soln.
申请公布号 JPH06148895(A) 申请公布日期 1994.05.27
申请号 JP19920296954 申请日期 1992.11.06
申请人 TORAY IND INC 发明人 YAMAHO YUKA;TOMIKAWA MASAO;ASANO MASAYA
分类号 C08L83/04;G03F7/004;G03F7/075;H01L21/027;(IPC1-7):G03F7/075 主分类号 C08L83/04
代理机构 代理人
主权项
地址