发明名称 Stabilisation of plasma generation using electron beam evaporator for metals - focusing electron beam on evaporator material within housing and monitoring intensity of light emission above surface, to control power supply to electron gun
摘要 The housing (1) has an electron gun (2) coupled to a high voltage supply (3). The electron gun is controlled to provide a constant output power (4). The beam is focused on to the evaporator surface (5) and produces a high vapour pressure over the surface. Typically the evaporation material is aluminium oxide. A reaction gas is introduced through a side valve (7). Optical sensors (8) set above the surface measure the intensity of the emission in different zones. The sensor signals are processed (9) and compared with a reference with the output used to control the power supply (11). USE/ADVANTAGE - For surface treatment, e.g. in metallurgy, engineering, optics, and packaging and glass industries. Provides stabilised plasma generation at high vaporisation rates.
申请公布号 DE4304613(C1) 申请公布日期 1994.05.26
申请号 DE19934304613 申请日期 1993.02.16
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN 发明人 KIRCHHOFF, VOLKER, O-8051 DRESDEN;GOEDICKE, KLAUS, O-8019 DRESDEN;METZNER, CHRISTOPH, O-8051 DRESDEN;SCHEFFEL, BERT, O-8019 DRESDEN
分类号 C23C14/32;H01J37/30;H01J37/304;H01J37/305;H05H1/00;(IPC1-7):H01J37/32;C23C14/30;H05H1/24 主分类号 C23C14/32
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