发明名称 |
Stabilisation of plasma generation using electron beam evaporator for metals - focusing electron beam on evaporator material within housing and monitoring intensity of light emission above surface, to control power supply to electron gun |
摘要 |
The housing (1) has an electron gun (2) coupled to a high voltage supply (3). The electron gun is controlled to provide a constant output power (4). The beam is focused on to the evaporator surface (5) and produces a high vapour pressure over the surface. Typically the evaporation material is aluminium oxide. A reaction gas is introduced through a side valve (7). Optical sensors (8) set above the surface measure the intensity of the emission in different zones. The sensor signals are processed (9) and compared with a reference with the output used to control the power supply (11). USE/ADVANTAGE - For surface treatment, e.g. in metallurgy, engineering, optics, and packaging and glass industries. Provides stabilised plasma generation at high vaporisation rates.
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申请公布号 |
DE4304613(C1) |
申请公布日期 |
1994.05.26 |
申请号 |
DE19934304613 |
申请日期 |
1993.02.16 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN |
发明人 |
KIRCHHOFF, VOLKER, O-8051 DRESDEN;GOEDICKE, KLAUS, O-8019 DRESDEN;METZNER, CHRISTOPH, O-8051 DRESDEN;SCHEFFEL, BERT, O-8019 DRESDEN |
分类号 |
C23C14/32;H01J37/30;H01J37/304;H01J37/305;H05H1/00;(IPC1-7):H01J37/32;C23C14/30;H05H1/24 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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