发明名称 MASK AND MANUFACTURE THEREOF
摘要 <p>PURPOSE: To provide a transmissive mask to be used in the laser abrasion of the surface of a material having sufficient and mechanical stability for forming an image with high precision and high quality. CONSTITUTION: The mask 1 includes a proper substrate 2 on which multi-layered dielectric 7 operated as reflection coating for a colliding excimer laser radiation is formed. The transparent area of the mask 1 is generated by the through-hole 5 of the mask 1. The through-hole 5 is formed by an against the mask 1 is generated so that the scattering of radiation beams from the side wall part of the through-hole 5 is restricted to min.</p>
申请公布号 JPH06138638(A) 申请公布日期 1994.05.20
申请号 JP19920278471 申请日期 1992.10.16
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 ANDORIYUU CHIN TAMU;GERUHAADO ERITSUHI BUORUBORUDO;BUERUNAA ZAPUKA
分类号 G03F1/20;H01L21/027;H01L21/30;(IPC1-7):G03F1/08 主分类号 G03F1/20
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