发明名称 Anodization apparatus with supporting device for substrate to be treated.
摘要 A supporting device for a treated substrate (1), applicable to a formation tank in which a chemical treatment is effected on said treated substrate supported in a treating solution comprises: a sealing member (5) with elasticity for supporting said treated substrate in hermetic fit to a peripheral portion thereof except for a surface to be treated; a substrate support jig (4) for supporting said sealing member; means (7) for introducing a fluid of gas or liquid from the outside into a hollow portion in said substrate support jig so that a pressure of said fluid urges said sealing member against said peripheral portion except for the surface to be treated on said substrate to achieve hermetic fit therebetween; and means for changing said pressure to control a deformation amount of said sealing member and an urging force thereon. <IMAGE>
申请公布号 EP0597428(A1) 申请公布日期 1994.05.18
申请号 EP19930118093 申请日期 1993.11.08
申请人 CANON KABUSHIKI KAISHA 发明人 FUJIYAMA, YASUTOMO, C/O CANON KABUSHIKI KAISHA;ISHII, MITSUHIRO, C/O CANON KABUSHIKI KAISHA;KANBE, SENJU, C/O CANON KABUSHIKI KAISHA;YONEHARA, TAKAO, C/O CANON KABUSHIKI KAISHA;TAKISAWA, TORU, C/O CANON KABUSHIKI KAISHA;OKITA, AKIRA, C/O CANON KABUSHIKI KAISHA;SAKAGUCHI, KIYOFUMI, C/O CANON KABUSHIKI KAISHA;WATANABE, TAKANORI, C/O CANON KABUSHIKI KAISHA;KOKUMAI, KAZUO, C/O CANON KABUSHIKI KAISHA
分类号 C25D5/02;C25D17/08 主分类号 C25D5/02
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