| 摘要 |
PURPOSE:To prevent the dissolution of metals such as Ni, Sn and Al by a resist removing agent by incorporating org. alkalis into the agent. CONSTITUTION:A resist removing agent having a compsn. consisting of about 10-40wt.% phenol, 30-70wt.% alkylbenzenesulfonic acid, 5-30wt.%, in total, of chlorine-contg. org. compds. and 1-20wt.% org. alkali is used. Even when water enters the removing agent in a removing stage to form HCl, this HCl as the principal cause of dissolution is neutralized by the org. alkali and removed. |
