发明名称 POLISH PAD
摘要 PURPOSE: To polish a workpiece like granite with high efficiency by forming abrasive particles so as to have a specific particle size respectively, presenting them in a layer in a specific concentration, and forming an abrasive surface for polish with the layer. CONSTITUTION: A supporting body 74 for a polishing pad 58 is stiff as well as flexible. The supporting body 74 can be formed from metal like steel or polymer, which has thermosetting properties or thermoplastic properties. Suitable thermosetting polymer includes phenol resin and polyurethane. Suitable thermoplastic polymers are acrylonitrile butadiene styrene polypropylene. On the surface of the supporting body 74, a layer 76 made of a non-porous thermoplastic polymer which includes a mass of discrete abrasive particles uniformly dispersed therein is fixed. The abrasive particles have a particle size of up to 500 microns respectively and are present in the layer in a concentration of up to 30 volume %.
申请公布号 JPH06134675(A) 申请公布日期 1994.05.17
申请号 JP19930094795 申请日期 1993.03.16
申请人 DE BEERS IND DIAMOND DIV LTD 发明人 JIYON SUTEIIRINGU SEKUSUTON;DERETSUKU NOOMAN RAITO
分类号 B24B7/22;B24D3/30;B24D7/00;B24D7/06;B24D13/14;(IPC1-7):B24D13/14 主分类号 B24B7/22
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