发明名称 METHOD AND APPARATUS FOR MANUFACTURING MICROSTRUCTURE BODY BY USING NONPLANE EXPOSED LIGHT BEAM LITHOGRAPHY
摘要 PURPOSE: To make it possible to manufacture micro-structures by using lithography technology by providing the above apparatus with a control means for generating a first control signal, supplying the signal to a first means, generating a second control signal and supplying the signal to a second means. CONSTITUTION: A computer 28 supplies the signals to a biaxial servo controller 68 in the form of command for the movement of a rotary stage 48 and a linear stage 56. These signals are supplied to an amplifier 72 and thereafter, an amplifier 72 supplies a rotation command signal to a rotation stage 48 and a linear command signal to a linear stage 56, by which the desired motions of both stages can be generated. As both stages are operated, both stages generate the feedback signals indicating the respective motion degrees which are supplied to the biaxial servo controller 68. The signals are then supplied to the computer 28. The feedback signals are compared with the command signals and are subjected to correction at need.
申请公布号 JPH06134586(A) 申请公布日期 1994.05.17
申请号 JP19920012968 申请日期 1992.01.28
申请人 SAAKOSU GROUP 发明人 SUCHIIBUN SHII YAKOBUSEN;DEBITSUDO ERU UERUZU;KURAAKU DEEBISU;JIYON II UTSUDO
分类号 B23K26/00;B23K15/00;B23K17/00;B23K26/08;B81B1/00;B81C99/00;G01P15/08;G01P15/09;G01P15/18;G03F7/20;G05B19/18;G12B1/00;H01L21/00;H01L21/027;H01L21/302;H01L21/3065;H01L21/48;H01L21/68;H01L41/09;(IPC1-7):B23K26/00 主分类号 B23K26/00
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