发明名称 PREPARATION OF INORGANIC THIN FILM BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION
摘要 <p>The present invention is a method for manufacturing inorganic membranes which are capable of separating oxygen from air. The membranes comprise a thin layer of a multicomponent metallic oxide which has been deposited onto a porous substrate by organometallic chemical vapor deposition. The inorganic membranes are formed by reacting organometallic complexes corresponding to each of the respective metals making up the multicomponent metallic oxide and an oxidizing agent under conditions sufficient to deposit a thin layer of the multicomponent metallic oxide onto the porous substrate.</p>
申请公布号 JPH06135703(A) 申请公布日期 1994.05.17
申请号 JP19920358728 申请日期 1992.12.28
申请人 AIR PROD AND CHEM INC 发明人 ROBIN EDOWAADO RICHIYAAZU;ROBAATO RUISU IIAMUPIETOROU;POORU NAIJIERU DAIAA
分类号 B01D71/02;C01B13/14;C01G49/00;C04B41/52;C23C16/04;C23C16/40;C23C16/46;(IPC1-7):C01B13/14 主分类号 B01D71/02
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