| 摘要 |
Cell for continuous electrolytic deposition treatment of bars or the like The cell for continuous electrolytic deposition treatment of bars or the like according to the invention comprises a closed vessel containing at least one tubular anode through which a bar for electrolytic processing can be conveyed in the axial direction, the bar being inserted into the vessel and leaving the vessel through respective inlet, and outlet mouthpieces equipped with scaling means, means being present for supplying a flow of electrolytic bath to the anode or anodes and transferring the bath from the anode to the vessel, producing a flow of the bath inside the anode and parallel to the bar to be processed, dielectric spacing means also being present between the bar inlet mouthpiece and the end of the adjacent anode and adapted to define a zone of controlled chemical attack before electroplating begins.
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