| 摘要 |
PURPOSE:To obtain a radiation-sensitive resin composition showing high sensitivity, high resolution and high residual film ratio, providing a microlens having high refractive index, excellent heat distortion resistance of submicron order, solvent resistance, etc., comprising a specific composition. CONSTITUTION:The composition comprises (A) an alkali-soluble resin, (B) 1,2- quinonediazide compound (preferably 2,2,4-trimethyl-7,2',4-trihydroxyflavan-1,2- naphthoquinoneazido-5--sulfonic acid ester), (C) a compound containing two or more epoxy groups (preferably bisphenol A type epoxy resin), (D) a melamine of formula I [R<1> to R<6> are H or CH2OR (R is H or 1-6C alkyl)] (e.g. hexamethylolmelamine) and (E) a trihalomethyltriazine of formula II [X is halogen, A is CX3, group of formula III (B is H, 1-10C alkyl, etc.), etc.] or an onium salt of the formula (A)nZ<+>Y<-> (Z is S or I; Y is BF4, PF6, etc.; n is 2 or 3) functioning as an optical acid generator. |
