发明名称 PATTERN POSITION MEASURING DEVICE
摘要 PURPOSE:To provide a pattern position measuring device, which precisely detects the slope of a specimen surface at an edge position of a pattern and corrects the edge position. CONSTITUTION:The height of the surface of a specimen 10 is measured at predetermined intervals. A deflection detection region 40 is defined in one part of the surface of the specimen 10 so as to include the edge position of the detected pattern. Then the deflection shape in the deflection detection region 40 is detected from the measured results at height measured points in the deflection detection region 40. The slope of the surface of the specimen 10 at the edge position is detected from the detected deflection shape so as to correct the edge position.
申请公布号 JPH06129814(A) 申请公布日期 1994.05.13
申请号 JP19920281721 申请日期 1992.10.20
申请人 NIKON CORP 发明人 MAEDA YASUKO
分类号 G01B11/00;G01B21/00;G01B21/20;H01L21/027;H01L21/30;(IPC1-7):G01B11/00 主分类号 G01B11/00
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