发明名称 |
THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE:To avoid the step disconnection in an insulating layer and the field concentration phenomenon occurring in the active layer ends of the thin film transistor by contriving the constitution of the active layer ends. CONSTITUTION:An active layer 31 of the film transistor is composed to make the end thickness thereof get gradually thinner so that the thickness of a gate insulating film 36 as an insulating layer covering the active layer 31 may not get thinner yet gentle at the ends of the active layer 31 thereby avoiding the occurrence of the field concentration phenomenon. |
申请公布号 |
JPH06132303(A) |
申请公布日期 |
1994.05.13 |
申请号 |
JP19910340338 |
申请日期 |
1991.11.29 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
KODAMA MITSUFUMI;KONDO NORIAKI |
分类号 |
H01L21/302;H01L21/3065;H01L21/336;H01L27/12;H01L29/78;H01L29/786 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|