| 摘要 |
PURPOSE:To provide a positive photosensitive compsn. of ternary chemical sensitization type having high sensitivity, high resolution and good profile without producing precipitation when the compsn. is stored for a long time. CONSTITUTION:The positive photosensitive compsn. contains (a) novolac resin, (b) compd. which produces acid by irradiation of active ray or radiation, and (c) low mol.wt. compd. having a single structure of <3000mol.wt. and tertiary alkylester groups, the solubility of which is increased by the effect of acid in an alkali developer. The compd. (c) is a compd. having at least two tertiary alkylester groups in which the distance between the two farest ester groups includes >=10 bonded atoms except for ester groups, or at least three tertiary alkylester groups in which the distance between the two farest ester groups includes >=9 bonded atoms except for ester groups. |
