发明名称 FORMING METHOD FOR TWISTED MULTILAYER INTERCONNECTIONS OF SEMICONDUCTOR DEVICE OR THE LIKE
摘要 <p>PURPOSE:To enhance wiring density by twisting interconnections of upper and lower layers via in-line or concentrated holes. CONSTITUTION:A left interconnection A of an upper wiring layer 2 is connected with a central interconnection A of a lower wiring layer 3 via holes 1 provided between right ends and the left ends of the central interconnection A. Further, the central interconnection A is connected with the left interconnection A via holes 1 provided between the right lower ends and a left lower end of the right interconnection A. Similarly, a left interconnection B the wiring layer 3 is connected with a central interconnection B of the wiring layer 2, and the central interconnection B 2 is connected with a right interconnection B of the wiring layer 3 via the holes 1 provided at predetermined positions of the interconnections. In this case, the wiring layers 2, 3 are twisted between the upper and lower layers.</p>
申请公布号 JPH06132622(A) 申请公布日期 1994.05.13
申请号 JP19920281372 申请日期 1992.10.20
申请人 HITACHI LTD 发明人 NAKADA KENSUKE;MISHIMAGI HIROMITSU
分类号 G11C11/413;H01L21/768;H01L23/522;H05K1/02;H05K1/11;H05K3/46;(IPC1-7):H05K1/11;H01L21/90 主分类号 G11C11/413
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