发明名称 |
METHOD FOR INSPECTING PHASE SHIFT PHOTOMASK |
摘要 |
<p>PURPOSE:To directly and accurately measure the phase difference of a phase shifter in a short period of time without any damage using a simple arrangement and the same wavelength as wavelength in actual use. CONSTITUTION:A 1st light A with specific wavelength lambda1 is converged on the arrangement part of the phase shifter FS and a 2nd light B with wavelength lambda2 slightly different from the specific wavelength is converged on a part where the phase shifter FS is not arranged; and transmitted lights of both the parts are put one over the other and photoelectrically converted by a photoelectric converting element D2 and parts of the lights before being made incident on both the parts are split by a half-mirror HM respectively. Both the split lights A and B are put one over the other and photoelectrically converted by a photoelectric converting element D1 and the phase difference between the two photoelectrically converted signals I1 and I2 is detected to measure the phase difference between both the parts.</p> |
申请公布号 |
JPH06130653(A) |
申请公布日期 |
1994.05.13 |
申请号 |
JP19920278737 |
申请日期 |
1992.10.16 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
FUJITA HIROSHI;TAKAHASHI YOICHI |
分类号 |
G03F1/26;G03F1/30;G03F1/84;H01L21/027;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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