发明名称 Platinum electroforming and platinum electroplating
摘要 The invention relates to platinum electroforming and platinum electroplating capable of preparing a deposited platinum material having high hardness and increased thickness and size. The platinum electroforming or electroplating bath comprises at least one compound selected from the group consisting of chloroplatinic acid, chloroplatinates of alkali metals, hydrogen hexahydroxoplatinate, and hexahydroxoplatinates of alkali metals, 2-100 g/l as platinum and a hydroxylated alkali metal, 20-100 g/l.
申请公布号 US5310475(A) 申请公布日期 1994.05.10
申请号 US19910718767 申请日期 1991.06.21
申请人 ELECTROPLATING ENGINEERS OF JAPAN, LIMITED 发明人 KITADA, KATSUTSUGU;YARITA, SOUMEI
分类号 A44C27/00;C25D3/50;C25D3/56;(IPC1-7):C25D1/00;C25D1/10 主分类号 A44C27/00
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