发明名称 |
Platinum electroforming and platinum electroplating |
摘要 |
The invention relates to platinum electroforming and platinum electroplating capable of preparing a deposited platinum material having high hardness and increased thickness and size. The platinum electroforming or electroplating bath comprises at least one compound selected from the group consisting of chloroplatinic acid, chloroplatinates of alkali metals, hydrogen hexahydroxoplatinate, and hexahydroxoplatinates of alkali metals, 2-100 g/l as platinum and a hydroxylated alkali metal, 20-100 g/l.
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申请公布号 |
US5310475(A) |
申请公布日期 |
1994.05.10 |
申请号 |
US19910718767 |
申请日期 |
1991.06.21 |
申请人 |
ELECTROPLATING ENGINEERS OF JAPAN, LIMITED |
发明人 |
KITADA, KATSUTSUGU;YARITA, SOUMEI |
分类号 |
A44C27/00;C25D3/50;C25D3/56;(IPC1-7):C25D1/00;C25D1/10 |
主分类号 |
A44C27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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