| 发明名称 |
SELECTED CHELATE RESINS AND THEIR USE FOR REMOVING POLYVALENT METALLIC IMPURITIES FROM RESIST COMPONENT |
| 摘要 |
A chemically modified chelate resin comprising the reaction product of a cross-linked polymer bead chelate resin containing amine reaction sites with an aromatic aldehyde selected from the group consisting of 4-Formyl-benzo-15-Crown-5; 4-Formyl-benzo-18-Crown-6; 3,4-dihydroxybenzaldehyde; 3-ethoxy salicylaldehyde; salicylaldehyde; 2-pyridine carboxaldehyde, 3-pyridine carboxaldehyde; 4-pyridine carboxaldehyde; and pyrrole-2-carboxaldehyde. |
| 申请公布号 |
JPH06128321(A) |
申请公布日期 |
1994.05.10 |
| 申请号 |
JP19930155969 |
申请日期 |
1993.06.28 |
| 申请人 |
O C G MICROELECTRON MATERIALS INC |
发明人 |
KENJI HONDA |
| 分类号 |
B01J45/00;C08F8/28;C08F12/00;C08F12/08;C08F12/28;C08F12/36;C09K3/00;G03F7/004;H01L21/027;H01L21/30;(IPC1-7):C08F8/28 |
主分类号 |
B01J45/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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