| 发明名称 |
MANUFACTURE OF SEMICONDUCTOR DEVICE |
| 摘要 |
PURPOSE:To increase the number of product chips by decreasing the number of exclusive patterns for auto alignment on a semiconductor substrate and by reducing the occupied area of the patterns. CONSTITUTION:The line width of an exclusive pattern 3 for auto alignment on a mask 1 is caused to fall below the resolving power of the title device. Consequently, exclusive patterns 3 for auto alignment on the mask 1 are not formed on a semiconductor substrate 2 so that it is possible to reduce the occupied area of the exclusive patterns 5 for auto alignment built in the semiconductor substrate 2 to increase the number of product chips on the substrate 2. |
| 申请公布号 |
JPH06124868(A) |
申请公布日期 |
1994.05.06 |
| 申请号 |
JP19920272582 |
申请日期 |
1992.10.12 |
| 申请人 |
MATSUSHITA ELECTRON CORP |
发明人 |
ISAKA TAKASHI;OSAKABE AKIHIKO;NAKANO MUNEAKI |
| 分类号 |
G03F1/42;G03F9/00;H01L21/027;H01L21/30 |
主分类号 |
G03F1/42 |
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