发明名称 X-ray mask copying system using X-ray beam lithography - uses telescope and capacitive spacing sensor for accurate alignment and spacing of mask holders and heat sink
摘要 The X-ray mask copying system uses two mask holders (1..3; 4..6) and a heat sink (12) for the obtained mask copy, with accurate alignment and spacing of the master mask and the copy via a sliding, autocollimation telescope (18). The exact spacing of the heat sink and the copy is provided by at least one capacitive spacing sensor (13). Pref. each mask holder has a metal holding plate (3, 6), an attached carrier plate (2, 5) and a reception device (1, 4) for the carrier plate, allowing adjustment of the latter via coordinate setting screws (11). ADVANTAGE - Increased alignment and spacing precision of lithography components.
申请公布号 DE4242632(C1) 申请公布日期 1994.05.05
申请号 DE19924242632 申请日期 1992.12.17
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN, DE 发明人 GRIMM, JUERGEN, DR., 1000 BERLIN, DE;CHLEBEK, JUERGEN, DR., 1000 BERLIN, DE;LOECHEL, BERND, DR., 1000 BERLIN, DE;ENGLER, KLAUS-DIETER, 1000 BERLIN, DE
分类号 G03F7/20;G03F9/00;(IPC1-7):G03F9/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址