发明名称 |
Method and apparatus for optical emission end point detection in plasma etching processes |
摘要 |
An apparatus and method for determining the time at which a plasma etching process should be terminated. The process generates at least one etch product species and a continuum plasma emission. The apparatus monitors the optical emission intensity of the plasma in a narrow band centered about a predetermined spectral line and generates a first signal indicative of the spectral intensity of the etch product species. The apparatus further monitors the optical emission intensity of the plasma in a wide band and generates a second signal indicative of the spectral intensity of the continuum plasma emission. The apparatus further monitors the magnitudes of the first and second signals and generates a termination signal when the magnitudes diverge.
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申请公布号 |
US5308414(A) |
申请公布日期 |
1994.05.03 |
申请号 |
US19920995727 |
申请日期 |
1992.12.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
O'NEILL, JAMES A.;PASSOW, MICHAEL L.;SINGH, JYOTHI |
分类号 |
G01J3/00;G01J3/443;H01J37/32;H01L21/302;H01L21/3065;H05H1/00;H05H1/46;(IPC1-7):G01N21/00 |
主分类号 |
G01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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