发明名称 Semiconductor strained SL APD apparatus
摘要 By making the lattice constant of barrier layers of a superlattice avalanche photodiode lower than the lattice constant of well layers to apply a tensile stress to the barrier layers, a high gain-bandwidth product can be obtained with a high ionization rate ratio kept.
申请公布号 US5308995(A) 申请公布日期 1994.05.03
申请号 US19920910480 申请日期 1992.07.08
申请人 HITACHI, LTD. 发明人 TSUJI, SHINJI;NAKAMURA, HITOSHI
分类号 H01L31/0352;H01L31/107;H04B10/155;(IPC1-7):H01L27/14 主分类号 H01L31/0352
代理机构 代理人
主权项
地址