| 摘要 |
PURPOSE:To enable the formation of resist patterns having good sectional rectangle without allowing scum to remain by compounding some kinds of ammonium salts with an ag. soln. contg. an org. salt base without contg. metal ions and a surfactant. CONSTITUTION:One kind of ammonium salt selected from ammonium sulfate and ammonium phosphate is compounded with the ag. soln. contg. the org. salt base without contg. the metal ions and the surfactant. For example, aryl and alkyl amine contg. straight chain type, branch type or ring primary, secondary and primary amines as a substituent, more specifically alkylene diamine, such as 1,3-diaminopropane, aryl amine, such as 4, 4'-diaminodiphenyl amine, amine, such as bisimine, and heterocyclic bases having 3 to 5 pieces of carbon atoms and 1 or 2 pieces of hetero atoms selected from nitrogen, oxygen and sulfur in the cyclic skeleton are used as the org. base without contg. the metal ions. |
