发明名称 HARDENING TREATMENT OF WATER-SOLUBLE PHOTORESIST PATTERN
摘要 PURPOSE:To provide a method for hardening treatment for a water-soluble photoresist which has no problems in handling property and harmfulness. CONSTITUTION:An aq. soln. consisting essentially of zirconium acetate is used as a hardener in the method for reinforcing the corrosion resistant film of resist patterns by treating the patterns of the water-soluble photoresist consisting essentially of casein with the hardener, then heating the patterns. As a result, the problems in the handling property and harmfulness are eliminated and the hardening treatment to increase an etching factor is executed. In addition, the problems of waste water pollution, etc., by chromium which are heretofore generated with the conventional hardenes are solved.
申请公布号 JPH06118661(A) 申请公布日期 1994.04.28
申请号 JP19910299725 申请日期 1991.10.19
申请人 FUJI YAKUHIN KOGYO KK 发明人 UMEHARA HIROSHI;ASANO TAKATERU;TAKITA EIJI
分类号 C01G25/00;G03F7/40;H01J9/14;H01J29/07;(IPC1-7):G03F7/40 主分类号 C01G25/00
代理机构 代理人
主权项
地址