ABERRATION MEASURING METHOD

摘要

PURPOSE:To enable a projection exposing device to self-measure the asymmetrical aberration of its projecting optical system in a short time. CONSTITUTION:A vernier mark image 32XP is exposed by changing a focusing position in shot areas 34-1 and 34-2 on a wafer 11 after the focusing position is fixed in the areas 34-1 and 34-2 and main scale mark images 28XP and 30XP are exposed. By approximating the positional deviation DELTAx1 between the main scale mark images 28XP and 30XP and the vernier mark image 32XP by using the function of the focusing position F, the factor of a symmetrical component is found with respect to the focusing position F in the function. From the relation between a previously calculated factor and the quantity of a comatic aberration, the quantity of the comatic aberration is found.