| 摘要 |
PURPOSE:To obtain the effect similar to the effect of double exposures of the intensity distribution of the ordinary light transmitted through a photomask and the intensity distribution of the extraordinary light with one time of exposing stage by providing the front or rear surface of a transparent substrate with a base material which generates double refractions. CONSTITUTION:The photomask 10 is irradiated with light having a desired wavelength from a light shielding part 3 side and transfer patterns are projected onto a photosensitive material layer 4 by the light transmitted through the photomask. The incident light on the photomask 10 propagates in the base material 2 by dividing to the ordinary light 13 and extraordinary light 14 of the polarization directions intersecting orthogonally with each other. The ordinary light 13 and the extraordinary light 14 are transmitted from the photomask 10 in the state of shifting from each other according to the material quality and thickness of the base material 2. The ordinary light 13 has the intensity distribution 11 and the extraordinary light 14 has the intensity distribution 12 of the extraordinary light at this time. The desired deviation is applied to the light transmitted from the photomask 10 by selecting the material quality and thickness of the base material 2. |
