| 摘要 |
PURPOSE:To facilitate the control of the size of a transferred pattern, by constituting a tightly closed system wherein the part from at least a photomask to a wafer support is tightly closed with s single medium or a plurality of mediums, in a projection aligner. CONSTITUTION:A projection aligner includes a condenser lens 2, a photomask 3, a projection lens 4, a wafer 5, and a wafer support 10, in a closed system 9. The light outputted from a light source 1 is directed to the condenser lens 3 through a first reflecting mirror 13, an integrator 14 and a second reflecting mirror 15. The effect of diffraction is controlled by a medium 6 whose real refractive index is (n), and the wavelength is shortened. This light is directed to the photomask 3, and the wafer 5 is irradiated with the light through the projection lens 4. The light whose wavelength is shortened scarcely enters a light shielding part, and a fine pattern is formed. Thereby the size of a fine pattern can be controlled and corrected. |
