| 摘要 |
PURPOSE:To obtain a positive type resist composition high in sensitivity and resolution and superior in process aptitude and sensitive to high energy rays and developable with an aqueous alkaline solution by incorporating a silicone polymer and a specified onium salt. CONSTITUTION:The positive type resist material comprises the silicone polymer (A) represented by formula I and the onium salt (B) represented by (R)pAM and it can be developed with the aqueous alkaline solution and it is sensitive to high energy rays, and when needed, further it may contain a dissolution inhibitor. In formulae I and (R)pAM the sum of x and m is 1, and X is not 0; n is an integer of 1-3; each of plural R is, independently, an optionally substituted aromatic group; A is sulfonium or trifluoromethanesulfonate, and p is 2 or 3. |
