| 摘要 |
PURPOSE:To prevent crystal of resist solution re-attaching to a nozzle. CONSTITUTION:A resist coater spreads resist solution on a wafer W to be processed which is sucked and retained by a spin chuck 50, from a solution feeding nozzle 60. In the resist coater the following are installed; a nozzle awaiting part 62 which makes a nozzle wait, and a dummy spouting part 64 which performs dummy spouting (dummy dispensing). A solvent discharging part 108 which makes the solvent flow down along the whole periphery of the inner wall of the dummy spouting part 64 is formed, thereby discharging crystal or the like of the resist solution scattered at the time of dummy dispensing. |
