| 摘要 |
PURPOSE:To provide a resist material which is excellent in resist characteristics, such as sensitivity, resolution, etching resistance, preservable stability and heat resistance, and is balanced in these characteristics at a high degree. CONSTITUTION:The compd. having acid unstable groups of the resist compsn. contg. an alkali-soluble phenolic resin (A), the compd. having the acid unstable groups (B) and a compd. (C) which can form an acid by irradiation with active rays is a compd. formed by substituting at least a part of the hydroxyl groups of a specific phenolic resin with the acid unstable groups. |
