Vacuum processing apparatus

摘要

A vacuum processing apparatus for LCD substrates comprises three process chambers. Each of these process chambers is connected to a first load lock chamber via a gate. A second load lock chamber is connected to the first load lock chamber via another gate. A transfer member arranged under the air atmosphere is located to face the second load lock chamber. A retractable arm for transferring a substrate between each of the process chambers and the second load lock chamber is arranged within the first load lock chamber. Also arranged within the first load lock chamber is a storing member for temporarily storing the substrate. These storing member and the arm are supported by a rotatable base. The storing member has four different height levels for supporting the substrate, and is moved in a vertical direction.