Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol

摘要

A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): (* CHEMICAL STRUCTURE *) (A) wherein R1=hydrogen, lower alkyl group having 1-4 carbon atoms, halogen, or lower alkoxy group having 1-4 carbon atoms; wherein R2=hydrogen or lower alkyl group having 1-4 carbon atoms; and wherein X is selected from the group consisting of: CH2, CH(CH3), C(CH3)2, O, and S; with a bismethylol monomer selected from a difunctional ortho-, ortho-phenolic bismethylol of Formula (B), a difunctional ortho-, para-phenolic bismethylol of Formula (C): (* CHEMICAL STRUCTURE *) (B) (* CHEMICAL STRUCTURE *) (C) wherein R3 is selected from CH3, CH2CH3, Cl, and Br; and wherein R4 is selected from H and CH3.