| 摘要 |
<p>PURPOSE:To provide a vacuum suction table which can secure the flatness of a semiconductor wafer under vacuum suction condition. CONSTITUTION:A vacuum suction table 10 mainly consists of a suction part 11, pedestal upper part 13, and lower part 15, wherein the suction part 11 is made of porous ceramic as a drafty member while the pedestal upper 13 and lower 15 are made of high hardness ceramic as a nondrafty member. The pedestal lower 15 is of a plate form structure in which a through hole 155 and a groove 159 in continuity thereto are formed. Therefore, the oversurface 151 of the pedestal lower 15 where the suction part 11 is jointed, can be plane machined and polished after high temp. baking process. This allows preventing the suction part 11 from deflecting due to the suction pressure when the wafer is sucked fast and accomplishes high precision processing of the semiconductor wafer.</p> |
