发明名称 METHOD AND DEVICE TO RETOUCH DEFECT IN FILTER PATTERN
摘要 <p>PURPOSE:To exactly and stably supply a proper amt. of coloring ink according to the size (area) and state (depth of defect) of defect when the defect is retouched with supplement of the coloring ink in the coloring picture element of the filter, to supply the ink without damaging the filter substrate (glass substrate) in the defect, and to rapidly and stably retouch the defect of the filter coloring pattern. CONSTITUTION:After bringing the top end 7a of a plotting pin 7 for retouching a filter into contact with a pattern defect 4 of the filter 2, a coloring ink 9 for retouchin9 is properly pushed out through the top end 7a of the plotting pin to fill the pattern defect 4 with the ink.</p>
申请公布号 JPH06109914(A) 申请公布日期 1994.04.22
申请号 JP19920261693 申请日期 1992.09.30
申请人 TOPPAN PRINTING CO LTD 发明人 SHIMA YASUHIRO;TACHIBANA SHINYA;OKAMURA TAKASHI;TAKIGAWA SHIGEAKI
分类号 G02B5/20;(IPC1-7):G02B5/20 主分类号 G02B5/20
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