MANUFACTURE OF THIN FILM STRUCTURE

摘要

PURPOSE: To facilitate the production of a thin-film structure by patterning second thin-film layers on one surface of a substrate in a photoetching manner by using the radiations directed onto light shielding patterns. CONSTITUTION: A metallic layer is first deposited on the rear surface of a glass substrate 10 to be molded with the thin-film structure thereon and the layer is restricted in a photoetcing manner by using such a mask which allows the metallic patterns to remain, by which the light shielding patterns are formed in the production of an active matrix substrate. The metallic patterns 20 include square regions 21, lines 22 of the sets extending between the adjacent lines of the regions 21 and bridge parts 23 connecting the respective regions 21 to the lines 22. The layers of transparent conductive materials, such as ITO and positive photoresist material layers, are continuously deposited on all on the substrate and are exposed to the double exposure from the rear surface of the substrate 10 by using the respective inclined nearly parallel radiations. The regions of the ITO materials corresponding to the regions 22, 21 of the light shielding patterns 20 are made to remain after the etching.