发明名称 MANUFACTURE OF COMPOUND SEMICONDUCTOR
摘要 <p>PURPOSE:To prevent wafer cracking due to an internal stress at the time of etching. CONSTITUTION:In a manufacture of a compound semiconductor wherein after a GaAlAs layer is liquid-phase epitaxially grown on a GaAs substrate to form a wafer 3, the GaAs substrate of the wafer 3 is removed by etching, the wafer 3 is fixed to a film 2 which deforms according to warpage of the wafer 3, an edge 2a of the film 2 outside the wafer 3 is fixed to a resin frame 1 to flexibly support the wafer 3 by the resin frame 1, and then the GaAs substrate is etched out.</p>
申请公布号 JPH06112162(A) 申请公布日期 1994.04.22
申请号 JP19920259438 申请日期 1992.09.29
申请人 SHARP CORP 发明人 ISHIKAWA YASUMASA
分类号 H01L21/302;H01L21/306;H01L21/68;H01L21/683;(IPC1-7):H01L21/302 主分类号 H01L21/302
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