| 摘要 |
PURPOSE:To form a stable resist pattern by conducting hydrophobic treatment and at least one-time heat treatment continuing to hydrophobic treatment in an atmosphere interrupted from other processes. CONSTITUTION:The shutter 18 of a resist-coating pretreatment equipment 8 is opened, and a substrate to be treated is carried to a hydrophobic treatment unit 9 by using a carrying means 14. The shutter 18 is closed and air is exhausted from an exhaust port 12, a hydrophobic treatment is supplied from a hydrophobic treatment supply port 10, and the substrate to be treated is heated at 100 deg.C. The substrate to be treated is carried to an oven unit, in which the substrate to be treated is heated, from the hydrophobic treatment unit 9, and heated and treated. Heat treatment is completed, air is exhausted from the exhaust port 17 of the resist-coating pretreatment equipment 8, and nitrogen is sent in from a purge-gas supply port 16 and purged for sixty sec. Accordingly, contamination resulting from the hydrophobic treatment can be prevented. |
